China Lithography Conference and BEAMeeting

The China Lithography Conference will take place at the ZTE Hotel in Shanghai from October 27 to 29, 2024. GenISys will participate in this event, and we are pleased to invite you to our BEAMeeting during the conference, which will be held on Monday, October 28, 2025.

Time:           Monday, October 28th, 2025          8:00 – 9:30 pm (CST)
Location:      ZTE Hotel Shanghai

The China Lithography Conference serves as a key platform for the R&D lithography community, bringing together industry experts and researchers to discuss the latest innovations in microlithography, SEM metrology, and other cutting-edge technologies. It plays a crucial role in fostering collaboration and driving technological advancements in the nanotechnology and semiconductor community.

Our BEAMeeting provides a technical exchange platform for e-Beam and laser lithography direct write users, with a focus on data preparation, PEC (Proximity Effect Correction), process correction, lithography simulation, and SEM metrology. The GenISys team will present updates on new features and share interesting case studies.

We look forward to welcoming you at the BEAMeeting in Shanghai. Please feel free to share this information with colleagues who may be interested in attending.

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